Nitrogen trifluoride (NF3) is a specialised fluorine-bearing oxidizing gas used chiefly to clean chemical vapor deposition chambers after dielectric and conductive films are deposited. Remote-plasma equipment dissociates the gas to remove deposits without opening the reactor, helping maintain equipment availability in high-volume wafer fabrication. The report identifies semiconductor...
Greek
English
Arabic
French
Spanish
Portuguese
Deutsch
Turkish
Dutch
Italiano
Russian
Romaian
Portuguese (Brazil)